期刊論文- Cheng-Yu Ma
| 出版年月 | 著作類別 | 著作名稱 | 作者 | 收錄出處 |
| 2025-01-01 | 期刊論文 | High-performance junctionless ferroelectric thin-film transistor for low-voltage and high-speed nonvolatile memory applications | William Cheng-Yu Ma, Chun-Jung Su, Kuo-Hsing Kao, Yu-Chieh Yen, Ji-Min ang, Yi-Han Li, Yen-Chen Chen, Jhe-Yu Lin, and Hui-Wen Chang | IEEE Transactions on Electron Devices |
| 2024-08-01 | 期刊論文 | Extracting device parameters of TFTs with ultrathin channels at low temperatures by particle swarm optimization | Y.-C. Chen, J.-P. Chou, K.-C. Chen, J.-Y. Lin, W. C.-Y. Ma, K.-H. Kao, M.-H. Chiang, Y.-H. Wang | IEEE Transactions on Electron Devices |
| 2024-04-01 | 期刊論文 | Impact of dual-gate configuration on the endurance of ferroelectric thin-film transistors with nanosheet polycrystalline-silicon channel film | William Cheng-Yu Ma, Chun-Jung Su, Kuo-Hsing Kao, Ta-Chun Cho, Jing-Qiang Guo, Cheng-Jun Wu, Po-Ying Wu, and Jia-Yuan Hung | ECS Journal of Solid State Science and Technology |
| 2023-10-01 | 期刊論文 | Exploring performance and reliability behavior of nanosheet channel thin-film transistors under independent dual gate bias operation | William Cheng-Yu Ma, Chun-Jung Su, Kuo-Hsing Kao, Yan-Qing Chen, Jing-Qiang Guo, Cheng-Jun Wu, Po-Ying Wu, and Jia-Yuan Hung | ECS Journal of Solid State Science and Technology |
| 2023-10-01 | 期刊論文 | Impact of nanosheet thickness on performance and reliability of polycrystalline-silicon thin-film transistors with double-gate operation | William Cheng-Yu Ma, Chun-Jung Su, Kuo-Hsing Kao, Jing-Qiang Guo, Cheng-Jun Wu, Po-Ying Wu, Jia-Yuan Hung | IEEE Transactions on Nanotechnology |
| 2023-05-01 | 期刊論文 | Ferroelectric tunnel thin-film transistor for synaptic applications | William Cheng-Yu Ma, Chun-Jung Su, Kuo-Hsing Kao, Ta-Chun Cho, Jing-Qiang Guo, Cheng-Jun Wu, Po-Ying Wu, and Jia-Yuan Hung | ECS Journal of Solid State Science and Technology |
| 2023-03-01 | 期刊論文 | Abnormal degradation behaviors under negative bias stress in flexible p-channel low-temperature polycrystalline silicon thin-film transistors after laser lift-off process | Chia-Chuan Wu, William Cheng-Yu M*, Ting-Chang Chang, Yu-Xuan Wang, Mao-Chou Tai, Yu-Fa Tu, Yu-An Chen, Hong-Yi Tu, Ya-Ting Chien, Han-Yu Chang, and Bo-Shen Huang | IEEE Transactions on Electron Devices |
| 2023-03-01 | 期刊論文 | Impacts of pulse conditions on endurance behavior of ferroelectric thin-film transistor non-volatile memory | William Cheng-Yu Ma, Chun-Jung Su, Kuo-Hsing Kao, Yao-Jen Lee, Pin-Hua Wu, Hsin-Chun Tseng, Hsu-Tang Liao, Yu-Wen Chou, Min-Yu Chiu, and Yan-Qing Chen | Semiconductor Science and Technology |
| 2022-11-01 | 期刊論文 | First demonstration of ferroelectric tunnel thin-film transistor non-volatile memory with polycrystalline-silicon channel and HfZrOx gate dielectric | William Cheng-Yu Ma, Chun-Jung Su, Kuo-Hsing Kao, Yao-Jen Lee, Ju-Heng Lin, Pin-Hua Wu, Jui-Che Chang, Cheng-Lun Yen, Hsin-Chun Tseng, Hsu-Tang Liao, Yu-Wen Chou, Min-Yu Chiu, and Yan-Qing Chen | IEEE Transactions on Electron Devices |
| 2022-04-01 | 期刊論文 | Demonstration of synaptic characteristics of polycrystalline-silicon ferroelectric thin-film transistor for application of neuromorphic computing | William Cheng-Yu Ma, Chun-Jung Su, Yao-Jen Lee, Kuo-Hsing Kao, Ting-Hsuan Chang, Jui-Che Chang, Pin-Hua Wu, Cheng-Lun Yen, and Ju-Heng Lin | Semiconductor Science and Technology |
| 2022-04-01 | 期刊論文 | First demonstration of heterogeneous IGZO/Si CFET monolithic 3-D integration with dual work function gate for ultralow-power SRAM and RF applications | Shu-Wei Chang, Tsung-Han Lu, Cong-Yi Yang, Cheng-Jui Yeh, Min-Kun Huang, Ching-Fan Meng, Po-Jen Chen, Ting-Hsuan Chang, Yan-Shiuan Chang, Jhe-Wei Jhu, Tzu-Chieh Hong, Chu-Chu Ke, Xin-Ren Yu, Wen-Hsiang Lu, Mohammed Aftab Baig, Ta-Chun Cho, Po-Jung Sung, Chun-Jung Su, Fu-Kuo Hsueh, Bo-Yuan Chen, Hsin-Hui Hu, Chien-Ting Wu, Kun-Lin Lin, William Cheng-Yu Ma, Darsen D. Lu, Kuo-Hsing Kao, Yao-Jen Lee, Cheng-Li Lin, Kun-Ping Huang, Kun-Ming Chen, Yiming Li, Seiji Samukawa, Tien-Sheng Chao, Guo-Wei Huang, Wen-Fa Wu, Wen-Hsi Lee, Jiun-Yun Li, Jia-Min Shieh, Jenn-Hwan Tarng, Yeong-Her Wang, and Wen-Kuan Yeh | IEEE Transactions on Electron Devices |
| 2021-12-01 | 期刊論文 | Impacts of independent dual-gate operation on reliability of nanosheet junctionless thin-film transistor | William Cheng-Yu Ma and Cai-Jia Tsai | IEEE Transactions on Electron Devices |
| 2021-01-01 | 期刊論文 | Impacts of O2 plasma on negative gate bias stress instability of tunnel thin-film transistor | William Cheng-Yu Ma, Po-Jen Chen, Yan-Shiuan Chang, Jhe-Wei Jhu, and Ting-Hsuan Chang | IEEE Transactions on Plasma Science |
| 2021-01-01 | 期刊論文 | Impacts of ammonia gas plasma surface treatment on polycrystalline-silicon junctionless thin-film transistor | William Cheng-Yu Ma, Shen-Ming Luo, Cai-Jia Tsai, Jiun-Hung Lin, Ming-Jhe Li, Jhe-Wei Jhu, Ting-Hsuan Chang, Po-Jen Chen, and Yan-Shiuan Chang | IEEE Transactions on Plasma Science |
| 2020-12-01 | 期刊論文 | Various reliability investigations of low temperature polycrystalline silicon tunnel field-effect thin-film transistor | William Cheng-Yu Ma, Hui-Shun Hsu, and Hsiao-Chun Wang | IEEE Transactions on Device and Materials Reliability |
| 2020-11-01 | 期刊論文 | Impacts of stress voltage and channel length on hot-carrier characteristics of tunnel field-effect thin-film transistor | William Cheng-Yu Ma and Shen-Ming Luo | IEEE Transactions on Electron Devices |
| 2020-09-01 | 期刊論文 | Subthreshold swing saturation of nanoscale MOSFETs due to source-to-drain tunneling at cryogenic temperatures | Kuo-Hsing Kao, Tzung Rang Wu, Hong-Lin Chen, Wen-Jay Lee, Nan-Yow Chen, William Cheng-Yu Ma, Chun-Jung Su, and Yao-Jen Lee | IEEE Electron Device Letters |
| 2020-07-01 | 期刊論文 | Impacts of vertically stacked monolithic 3D-IC process on characteristics of underlying thin-film transistor | William Cheng-Yu Ma, Yan-Jia Huang, Po-Jen Chen, Jhe-Wei Jhu, Yan-Shiuan Chang, and Ting-Hsuan Chang | IEEE Journal of the Electron Devices Society |
| 2020-03-01 | 期刊論文 | Gate capacitance effect on P-type tunnel thin-film transistor with TiN/HfZrO2 gate stack | William Cheng-Yu Ma, Ming-Jhe Li, Shen-Ming Luo, Jiun-Hung Lin, and Cai-Jia Tsai | Thin Solid Films |
| 2019-10-01 | 期刊論文 | Temperature dependence improvement of polycrystalline-silicon tunnel field-effect thin-film transistor | William Cheng-Yu Ma, J.-Y. Wang, L.-W. Yu, H.-C. Wang, Y.-J. Huang | Solid-State Electronics |
| 2018-08-01 | 期刊論文 | Dependence of sub-thermionic swing on channel thickness and drain bias of poly-Si junctionless thin-film transistor | William Cheng-Yu Ma, Jia-Yi Wang, Hsiao-Chun Wang, Yan-Jia Huang, and Li-Wei Yu | IEEE Electron Device Letters |
| 2018-08-01 | 期刊論文 | Impacts of channel film thickness on poly-Si tunnel thin-film transistors | William Cheng-Yu Ma, Hui-Shun Hsu, Chih-Cheng Fang, Che-Yu Jao, and Tzu-Han Liao | Thin Solid Films |
| 2018-04-01 | 期刊論文 | Impacts of trap-state generation on tunnel thin-film transistor | William Cheng-Yu Ma, Hui-Shun Hsu, Chih-Cheng Fang, Che-Yu Jao, and Tzu-Han Liao | IEEE Transactions on Electron Devices |
| 2017-03-01 | 期刊論文 | Current degradation by carrier recombination in a poly-Si TFET with gate-drain underlapping | William Cheng-Yu Ma | IEEE Transactions on Electron Devices |
| 2016-12-01 | 期刊論文 | Plasma induced interfacial layer impacts on TFETs with poly-Si channel Film by oxygen plasma surface treatment | William Cheng-Yu Ma, K. Chang, Y.-C. Lin, and T.-H. Wu | IEEE Transactions on Plasma Science |
| 2016-12-01 | 期刊論文 | Positive bias temperature instability improvement of poly-Si thin-film transistor with HfO2 gate dielectric by ammonia plasma treatment | William Cheng-Yu Ma, Z.-Y. Lin, Y.-S. Huang, B.-S. Huang, and Z.-D. Wu | IEEE Transactions on Plasma Science |
| 2016-11-01 | 期刊論文 | Performance improvement of poly-Si tunnel thin-film transistor by NH3 plasma treatment | William Cheng-Yu Ma, Y.-H. Chen, Z.-Y. Lin, Y.-S. Huang, B.-S. Huang, and Z.-D. Wu | Thin Solid Films |
| 2016-02-01 | 期刊論文 | Performance improvement of poly-Si tunnel FETs by trap density reduction | William Cheng-Yu Ma and Y.-H. Chen | IEEE Transactions on Electron Devices |
| 2015-12-01 | 期刊論文 | Bias temperature instability comparison of CMOS LTPS-TFTs with HfO2 gate dielectric | William Cheng-Yu Ma and C.-Y. Huang | Solid-State Electronics |
| 2015-10-01 | 期刊論文 | High-performance poly-Si TFT with ultra-thin channel film and gate oxide for low-power application | Y.-H. Chen, William Cheng-Yu Ma, and T.-S. Chao | Semiconductor Science and Technology |
| 2015-10-01 | 期刊論文 | Impact of crystallization method on poly-Si tunnel FETs | Y.-H. Chen, William Cheng-Yu Ma, J.-Y. Lin, C.-Y. Lin, P.-Y. Hsu, C.-Y. Huang, and T.-S. Chao | IEEE Electron Device Letters |
| 2014-12-01 | 期刊論文 | Reverse electrical behavior of n-channel and p-channel LTPS-TFTs by N2O plasma surface treatment | William Cheng-Yu Ma*, C.-Y. Huang, T.-C. Chan, S.-W. Yuan | IEEE Transactions on Plasma Science |
| 2014-12-01 | 期刊論文 | Threshold voltage reduction and mobility improvement of LTPS-TFTs with NH3 plasma treatment | William Cheng-Yu Ma*, S.-W. Yuan, T.-C. Chan, C.-Y. Huang | IEEE Transactions on Plasma Science |
| 2014-10-01 | 期刊論文 | Distinction between interfacial layer effect and trap passivation effect of N2 plasma treatment on LTPS-TFTs | William Cheng-Yu Ma* | Solid-State Electronics |
| 2014-03-01 | 期刊論文 | Asymmetric driving current modification of CMOS LTPS-TFTs with HfO2 gate dielectric | William Cheng-Yu Ma* | IEEE Transactions on Electron Devices |
| 2012-01-01 | 期刊論文 | Oxide thinning and structure scaling down effect of low-temperature poly-Si thin-film transistors | William Cheng-Yu Ma*, T.-Y. Chiang, J.-W. Lin, T.-S. Chao | IEEE/OSA Journal of Display Technology |
| 2011-04-01 | 期刊論文 | Channel film thickness effect of low-temperature polycrystalline-silicon thin-film transistors | William Cheng-Yu Ma, T.-Y. Chiang, C.-R. Yeh, T.-S. Chao*, T.-F. Lei | IEEE Transactions on Electron Devices |
| 2010-11-01 | 期刊論文 | A novel p-n-diode structure of SONOS-type TFT NVM with embedded silicon nanocrystals | T.-Y. Chiang, William Cheng-Yu Ma, Y.-H. Wu, K.-T. Wang, T.-S. Chao* | IEEE Electron Device Letters |
| 2010-10-01 | 期刊論文 | Low temperature Ni-nanocrystals-assisted hybrid polycrystalline silicon thin film transistor for non-volatile memory applications | T. T.-J. Wang, William Cheng-Yu Ma, S.-W. Hung, C.-T. Kuo* | Thin Solid Films |
| 2010-08-01 | 期刊論文 | Characteristics of SONOS-type flash memory with in-situ embedded silicon nanocrystals | T.-Y. Chiang, Y.-H. Wu, William Cheng-Yu Ma, P.-Y. Kuo, K.-T. Wang, C.-C. Liao, C.-R. Yeh, W.-L. Yang, T.-S. Chao* | IEEE Transactions on Electron Devices |
| 2010-06-01 | 期刊論文 | Low-temperature polycrystalline silicon thin film transistor nonvolatile memory using Ni nanocrystals as charge-trapping centers fabricated by hydrogen plasma process | T. T.-J. Wang, P.-L. Gao, William Cheng-Yu Ma, C.-T. Kuo* | Japanese Journal of Applied Physics |
| 2009-09-01 | 期刊論文 | MILC-TFT with high-k dielectrics for one-time-programmable memory application | T.-Y. Chiang, Ming-Wen Ma, Y.-H. Wu, P.-Y. Kuo, K.-T. Wang, C.-C. Liao, C.-R. Yeh, T.-S. Chao* | IEEE Electron Device Letters |
| 2009-07-01 | 期刊論文 | Electrical characteristics of high performance SPC and MILC p-channel LTPS-TFT with high-k gate dielectric | Ming-Wen Ma, T.-Y. Chiang, C.-R. Yeh, T.-S. Chao*, T.-F. Lei | Electrochemical and Solid-State Letters |
| 2009-07-01 | 期刊論文 | High-performance p-channel LTPS-TFT using HfO2 gate dielectric and nitrogen ion implantation | Ming-Wen Ma, T.-Y. Chiang, T.-S. Chao*, T.-F. Lei | Semiconductor Science and Technology |
| 2008-12-01 | 期刊論文 | Characteristics of HfO2/poly-Si interfacial layer on CMOS LTPS-TFTs with HfO2 gate dielectric and O2 plasma surface treatment | Ming-Wen Ma, T.-Y. Chiang, W.-C. Wu, T.-S. Chao*, T.-F. Lei | IEEE Transactions on Electron Devices |
| 2008-12-01 | 期刊論文 | Positive bias temperature instability (PBTI) characteristics of contact-etch-stop-layer-induced local-tensile-strained HfO2 nMOSFET | W.-C. Wu, T.-S. Chao*, T.-H. Chiu, J.-C. Wang, C.-S. Lai, Ming-Wen Ma, W.-C. Lo | IEEE Electron Device Letters |
| 2008-11-01 | 期刊論文 | Impacts of N2 and NH3 plasma surface-treatment on high performance LTPS-TFT with high-k gate dielectric | Ming-Wen Ma, T.-S. Chao*, T.-Y. Chiang, W.-C. Wu, T.-F. Lei | IEEE Electron Device Letters |
| 2008-09-01 | 期刊論文 | X-ray photoelectron spectroscopy energy band alignment of spin-on CoTiO3 high-k dielectric prepared by sol-gel spin coating method | K.-H. Kao, S.-H. Chuang, W.-C. Wu, T.-S. Chao*, J.-H. Chen, Ming-Wen Ma, R.-H. Gao, M. Y. Chiang | Applied Physics Letters |
| 2008-08-01 | 期刊論文 | Performance and Interface Characterization for contact etch stop layer–strained nMOSFET with HfO2 gate dielectrics under pulsed-IV measurement | W.-C. Wu, T.-S. Chao*, T.-H. Chiu, J.-C. Wang, C.-S. Lai, Ming-Wen Ma, W.-C. Lo | Electrochemical and Solid-State Letters |
| 2008-07-01 | 期刊論文 | Carrier transportation mechanism of the TaN/HfO2/IL/Si structure with silicon surface fluorine implantation | W. C. Wu, C.-S. Lai, T.-M. Wang, J.-C. Wang, C. W. Hsu, Ming Wen Ma, W.-C. Lo, T. S. Chao* | IEEE Transactions on Electron Devices |
| 2008-06-01 | 期刊論文 | High performance metal-induced laterally crystallized polycrystalline silicon p-channel thin-film transistor with TaN/HfO2 gate stack structure | Ming-Wen Ma, T.-S. Chao*, C.-J. Su, W.-C. Wu, K.-H. Kao, T.-F. Lei | IEEE Electron Device Letters |
| 2008-05-01 | 期刊論文 | Reliability mechanisms of LTPS-TFT with HfO2 gate dielectric: PBTI, NBTI and hot carrier stress | Ming-Wen Ma, C.-Y. Chen, C.-J. Su, W.-C. Wu, K.-H. Kao, T.-S. Chao*, T.-F. Lei | IEEE Transactions on Electron Devices |
| 2008-03-01 | 期刊論文 | Improvement on performance and reliability of TaN/HfO2 LTPS-TFTs with fluorine implantation | Ming-Wen Ma, C.-Y. Chen, C.-J. Su, W.-C. Wu, T.-Y. Yang, K.-H. Kao, T.-S. Chao*, T.-F. Lei | Solid-State Electronics |
| 2008-02-01 | 期刊論文 | Analysis of negative bias temperature instability in body-tied low-temperature polycrystalline silicon thin-film transistors | C.-Y. Chen*, Ming-Wen Ma, W.-C. Chen, H.-Y. Lin, K.-L. Yeh, S.-D. Wang, and T.-F. Lei | IEEE Electron Device Letters |
| 2008-02-01 | 期刊論文 | Characteristics of PBTI and hot carrier stress for LTPS-TFT with high-k gate dielectric | Ming-Wen Ma, C.-Y. Chen, C.-J. Su, W.-C. Wu, Y.-H. Wu, K.-H. Kao, T.-S. Chao*, T.-F. Lei | IEEE Electron Device Letters |
| 2008-02-01 | 期刊論文 | Impacts of fluorine ion implantation with low-temperature solid-phase crystallized activation on high-k LTPS-TFT | Ming-Wen Ma, C.-Y. Chen, C.-J. Su, W.-C. Wu, Y.-H. Wu, T.-Y. Yang, K.-H. Kao, T.-S. Chao*, T.-F. Lei | IEEE Electron Device Letters |
| 2008-01-01 | 期刊論文 | Current transport mechanism for HfO2 gate dielectrics with fluorine incorporation | W. C. Wu, C. S. Lai, T. M. Wang, J. C. Wang, C. W. Hsu, Ming Wen Ma, T. S. Chao* | Electrochemical and Solid-State Letters |
| 2008-01-01 | 期刊論文 | Optimized ONO thickness for multi-level and 2-bit/cell operation for wrapped-select-gate (WSG) SONOS memory | W.-C. Wu, T.-S. Chao*, W.-C. Peng, W.-L. Yang, J.-H. Chen, Ming-Wen Ma, C.-S. Lai, T.-Y. Yang, C.-H. Lee, T.-M. Hsieh, J. C. Liou, T. P. Chen, C. H. Chen, C. H. Lin, H. H. Chen, Joe Ko | Semiconductor Science and Technology |
| 2007-10-01 | 期刊論文 | Nonvolatile memory characteristics with embedded hemispherical silicon nanocrystals | J.-H. Chen, T.-F. Lei, Dolf Landheer, Xiaohua Wu, Ming-Wen Ma, W.-C. Wu, T.-Y. Yang, and T.-S. Chao* | Japanese Journal of Applied Physics |
| 2007-08-01 | 期刊論文 | Bias temperature instabilities for low-temperature polycrystalline silicon complementary thin-film transistors | C.-Y. Chen*, J.-W. Lee, Ming-Wen Ma, W.-C. Chen, H.-Y. Lin, K.-L. Yeh, S.-D. Wang, and T.-F. Lei | Journal of The Electrochemical Society |
| 2007-07-01 | 期刊論文 | High-performance HfO2 gate dielectrics fluorinated by postdeposition CF4 plasma treatment | W. C. Wu, C. S. Lai, J. C. Wang, J. H. Chen, Ming Wen Ma, and T. S. Chao* | Journal of The Electrochemical Society |
| 2007-05-01 | 期刊論文 | A reliability model for low-temperature polycrystalline silicon thin-film transistors | C.-Y. Chen*, J.-W. Lee, P.-H. Lee, W.-C. Chen, H.-Y. Lin, K.-L. Yeh, Ming-Wen Ma, S.-D. Wang, and T.-F. Lei | IEEE Electron Device Letters |
| 2007-03-01 | 期刊論文 | Impact of high-k offset spacer in 65-nm node SOI devices | Ming-Wen Ma, C.-H. Wu, T.-Y. Yang, K.-H. Kao, W.-C. Wu, T.-S. Chao*, and T.-F. Lei | IEEE Electron Device Letters |
| 2006-11-01 | 期刊論文 | High-k material sidewall with source/drain-to-gate non-overlapped structure for low standby power applications | Ming-Wen Ma*, T.-S. Chao, K.-H. Kao, J.-S. Huang, and T.-F. Lei | Japanese Journal of Applied Physics |
| 2006-09-01 | 期刊論文 | Fringing electric field effect on 65-nm-node fully depleted silicon-on-insulator devices | Ming-Wen Ma*, T.-S. Chao, K.-H. Kao, J.-S. Huang, and T.-F. Lei | Japanese Journal of Applied Physics |
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