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會議論文- Cheng-Yu Ma

編號 著作名稱
1 William Cheng-Yu Ma, Yao-Sheng Huang, Bo-Siang Huang, and Zheng-Da Wu, "Temperature effect and reliability improvement of Thin-Film transistor by plasma treatment," APSPT-9/SPSM-28, pp. P1-1, Dec. 2015.
2 William Cheng-Yu Ma, Meng-Chien Lee, Chi-Yuan Huang, "Bi-layer dielectric structure of IGZO thin-film transistor for gate stack and passivation layer application," 2015 International Thin Films Conference (TACT2015), pp. #454, Nov. 2015.
3 William Cheng-Yu Ma and Chi-Yuan Huang, "Performance improvement of LTPS-TFTs with various plasma surface treatment," ISPlasma2015/IC-PLANTS2015, pp. A4-P-07, Mar. 2015.
4 William Cheng-Yu Ma and Y.-H. Chen, "BTI comparison of CMOS LTPS-TFTs with high-k gate dielectric," 2014 International Electron Devices and Materials Symposium (IEDMS 2014), pp. #1230, Nov. 2014.
5 William Cheng-Yu Ma, "Surface roughness scattering improvement of LTPS-TFTs by O2 plasma oxidation," The 8th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-8), pp. 163, Dec. 2013.
6 William Cheng-Yu Ma, "Threshold voltage reduction and mobility improvement of LTPS-TFTs by N2 plasma nitridation," The 8th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-8), pp. 46, Dec. 2013.
7 Woei-Cherng Wu, Tien-Sheng Chao, Te-Hsin Chiu, Jer-Chyi Wang, Chao-Sung Lai, Ming-Wen Ma, Wen-Cheng Lo, and Yi-Hsun Ho, "Performance enhancement for strained HfO2 nMOSFET with contact etch stop Layer (CESL) under pulsed-IV measurement," IEEE Conference on Electron Devices and Solid-State Circuits, pp. 161-164, Dec. 2007.
8 Woei Cherng Wu, Chao Sung Lai, Tsui Ming Wang, Jer Chyi Wang, Ming Wen Ma, and Tien Sheng Chao, "Current transportation mechanism of HfO2 gate dielectrics with silicon surface fluorine implantation (SSFI) in CMOS Application," International Conference on Solid State Devices and Materials, pp. 408-409, Sep. 2007.
9 Chih-Yang Chen, Ming-Wen Ma, Wei-Cheng Chen, Hsiao-Yi Lin, Kuan-Lin Yeh, Shen-De Wang, and Tan-Fu Lei, "NBTI-stress induced grain-boundary degradation in low-temperature poly-Si thin-film transistors," International Conference on Solid State Devices and Materials, pp. 438-439, Sep. 2007.
10 W.-C. Wu, T.-S. Chao, W.-C. Peng, W.-L. Yang, J.-C. Wang, J.-H. Chen, Ming-Wen Ma, C.-S. Lai, T.-Y. Yang, T.-P. Chen, C.-H. Chen, C.-H. Lin, H.-H. Chen, and Joe Ko, "A highly reliable multi-level and 2-bit/cell operation of wrapped-select-gate (WSG) SONOS memory with optimized ONO thickness," VLSI Technology, Systems and Applications, pp. 1-2, Apr. 2007.
11 Chih-Yang Chen, Tong-Yi Wang, Ming-Wen Ma, Wei-Cheng Chen, Hsiao-Yi Lin, Kuan-Lin Yeh, Shen-De Wang, and Tan-Fu Lei, "Dynamic negative bias temperature instability in low-temperature poly-Si thin-film transistors," International Asia Display Conference, pp. 1233-1237, Mar. 2007.
12 Ming-Wen Ma, Tsung-Yu Yang, Kuo-Hsing Kao, Chun-Jung Su, Chih-Yang Chen, Tien-Sheng Chao, and Tan-Fu Lei, "Mobility improvement of HfO2 LTPS-TFTs with nitrogen implantation," International Asia Display Conference, pp. 674-677, Mar. 2007.
13 Ming-Wen Ma, Tsung-Yu Yang, Kuo-Shing Kao, Tien-Sheng Chao, and Tan-Fu Lei, "Improvement on performance and reliability of TaN/HfO2 LTPS-TFTs with fluorine implantation," International Thin Film Transistors Conference, pp. 352-355, Jan. 2007.
14 Ming-Wen Ma, Tsung-Yu Yang, Kuo-Shing Kao, Chun-Jung Su, Tien-Sheng Chao, and Tan-Fu Lei, "High performance LTPS-TFTs with HfO2 gate dielectric and nitric acid pre-treatment," International Workshop on Dielectric Thin Films for Future ULSI Devices Technical Program, pp. 33-34, Nov. 2006.
15 Ming-Wen Ma, Kuo-Shing Kao, Tien-Sheng Chao, and Tan-Fu Lei, "Ultra-low temperature growth of aluminum silicate dielectric formed by nitric acid," International Workshop on Dielectric Thin Films for Future ULSI Devices Technical Program, pp. 81-82, Nov. 2006.
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